Characterization Sheffield-IMG_2740-1-DCA-Cluster-tool-8

Structural

Sheffield

Characterization Sheffield Nomarski-Microscope
Nomarski Optical Microscope

3 microscopes with up to 100x magnification

  • Including Olympus Nomarski Optical Microscope for determining surface morphology and defect density

2 AFMs with batch scanning

  • Capability for up to 6” / multiple wafers for precise nanoscale imaging for sample surface morphology
  • Bruker Dimension ICON AFM
  • Veeco Dimension V AFM
Characterization Sheffield-Bruker-AFM-2
Bruker AFM

Carl Zeiss FEG SEM with <5nm resolution & EDX

Coxem table top SEM for rapid sample feedback

Panalytical XRD

Bruker & Panalytical XRD Systems

  • Up to 6” wafers, used for measuring strain and composition of epitaxy materials

Cambridge

Facilities at Cambridge concentrate on the growth of Gallium Nitride based materials using state of the art electron microscopy and X-ray diffraction facilities.

High-Resolution XRD:

  • Philips (PANalytical) high-resolution MRD X-ray diffractometer (P2)
  • PANalytical Empyrean diffractometer with PIXcel3D detector (P1)

Electron Microscopy:

  • Access to a range of state-of-the art TEM and SEM instruments
  • A variable temperature cathodoluminescence (CL) system, which operates in conjunction with an advanced scanning electron microscope (SEM).
  • Bruker Dimension ICON AFM
  • Veeco Dimension V AFM

Time-resolved Cathodoluminescence Microscopy (TRCL):

  • An Allalin 4027 Chronos from Attolight, designed to work both in continuous (CW) and time-resolved (TR) cathodoluminescence modes.

For more information on the Cambridge characterisation facilities, please visit the Cambridge Centre for Gallium Nitride’s website: https://www.gan.msm.cam.ac.uk/facilities

UCL

Malvern PANalytical X’Pert3 Materials Research Diffractometer (MRD)

  • Fully automated source optics for rapid measurements and switching between different modes
  • Complete wafer mapping up to 100 mm is possible.

Bruker Dimension Icon AFM

  • A maximum scan range of 90 × 90 μm and sub-nanometre height resolution
  • Multiple operational modes enabling non-destructive and comprehensive analysis of mechanical, electrical, and magnetic properties.
  • Accommodates large samples and offers environmental control options for versatile experimental setups
Characterization UCL Bruker-AFM
Characterization UCL JEOL-SEM

JEOL JSM-IT100 SEM

  • Supports high- and low-vacuum operation, enabling the examination of both conductive and non-conductive samples without extensive preparation
  • Equipped with a high-sensitivity Everhart-Thornley secondary electron detector (SE) and backscattered electron detector (BSE)
  • Accommodates a variety of sample sizes, making it ideal for materials research, failure analysis, and quality control applications.