Quality Policy and Objectives

Quality Assurance and its Management are key in the Facility’s drive to improve customer service. We measure performance against Key Performance Indicators (KPIs) agreed with EPSRC.

The National Epitaxy Facility is dedicated to providing the UK compound semiconductor research community with high quality, innovative semiconductor products and services on behalf of the UK Engineering and Physical Sciences Research Council (EPSRC). To meet our strategic and operational objectives, we employ a Quality Management System (QMS), which is focussed on customer’s needs and expectations.

Regular reviews, the analysis of performance targets and a commitment to continual improvement, ensures the QMS is relevant and supports the organisation’s continuation as a supplier of world-class epitaxy materials.

Professor Jon Heffernan (September 2023)

EPSRC National Epitaxy Facility – Quality Objectives and Key Performance Indicators

EPSRC National Epitaxy Facility Quality Management System Scope

EPSRC National Epitaxy Facility – ISO9001:2015 Certificate


Collecting feedback from our users is a requirement from both EPSRC and our ISO 9001 certification. It is vital in allowing us to deliver a high quality of products and services, and maintain a good relationship with our customers.

Here is what some of our users recently said about us:

“My discussions and consultations with NEF staff about my wafer requirements have always been productive, helpful, and friendly. The NEF is an essential facility for the benefit of the entire UK semiconductor community.” Dr Jonathan Mar, Newcastle University 

The NEF team were very responsive and provided excellent expert advice and support, as always. The quantum wells were of very high quality with narrow exciton linewidth and homogeneous across the wafer.” Dr Paul Walker, University of Sheffield

Communications were always timely and useful. On the “responsiveness to innovation”, the addition of Te “exceeds expectations.” This is particularly important from the perspective of scaling towards industry, with IQE plc. now offering highly doped Te as standard for n-type.” Professor Louise Hirst, University of Cambridge

“Excellent interaction, technical support and timely response!” Dr Kevin Gallacher, University of Glasgow

A swift answer even when we needed to make changes. I have also interacted regularly with NEF staff and found them to be extremely knowledgeable scientifically and I value their expertise. Anonymous

“The staff were really helpful in assisting with tweaking any initial design to the facilities capabilities. The quote was returned in advance of our deadline. The staff made every effort to help design samples that will make a successful research programme.” Anonymous

The wafer arrived a lot quicker than expected and Zofia was very helpful and always quick to respond to emails.” Anonymous

To complete our short feedback form please click on the following link: Customer Feedback Form