The National Epitaxy Facility will provide a comprehensive cutting edge epitaxy service for both Group III-V and Group IV communities. Our objectives include providing a service which will:
- enable UK University research through provision of high quality semiconductor epitaxy for custom designed structures and devices
- supply all the important III-V materials as well as Group IV epitaxy and hybrid III-V/Group IV epitaxy
- provide comprehensive characterisation and documentation of wafers to ensure quality, accuracy, uniformity and performance
- ensure quality and a rapid response to the needs of users and EPSRC in the provision of the research service in line with Key Performance Indicators
- provide expert advice in all aspects of semiconductor growth, characterisation and initial device processing including advice and training on design of epilayer structures and device processing techniques